Solid-state element and solid-state element device

ABSTRACT

A solid-state element has: a semiconductor layer formed on a substrate, the semiconductor layer having a first layer that corresponds to an emission area of the solid-state element to and a second layer through which current is supplied to the first layer; a light discharge surface through which light emitted from the first layer is externally discharged, the light discharge surface being located on the side of the substrate; and an electrode having a plurality of regions that are of a conductive material and are in ohmic-contact with the second layer.

The present application is based on Japanese patent application Nos.2004-084282, 2004-223600 and 2005-044649, the entire contents of whichare incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to a solid-state element and a slid-state deviceand, particularly, to a solid-state element and a slid-state device thatprevent the separation of electrode and the reduction of bondingstrength cause by a thermal stress so as to discharge efficiently lightfrom inside of the device.

2. Description of the Related Art

One of conventional solid-state devices is a light emitting device thatan LED (light-emitting diode) element as a solid-state element ismounted on a substrate with a lead frame or a wiring pattern. In thelight emitting device using the LED element, it is important that lightconfined inside the LED element is reduced to enhance the externalradiation efficiency in order to have a high-brightness or high-outputdevice.

One of the LED elements is a flip-chip type LED element that asemiconductor layer is formed on a transparent substrate such assapphire and light is discharged from the side of the transparentsubstrate. The flip-chip type LED element is excellent in the externalradiation efficiency since it does not generate an optical loss in thesemiconductor layer or a passivation film. In the device mounting, theflip-chip type LED element is flip-chip bonded to a wiring member suchas a lead frame inside a reflow furnace at a temperature of 250 to 300°C.

In recent years, as a solder used for the electrical connection of LEDelement, a lead (Pb) free solder is researched according toconsiderations to the environment. The Pb free solder has a meltingpoint higher than a Pb containing solder, and therefore a problem iscaused that the emission efficiency lowers due to an increase in thermalstress in the flip-chip bonding of LED element.

Japanese patent application laid-open No. 11-150297 (related art 1)discloses a nitride semiconductor light emitting element that itsp-electrode is multilayered to improve the emission efficiency of such aflip-chip type LED element.

The nitride semiconductor light emitting element is composed of a firstpositive electrode that is in ohmic-contact with a p-GaN basedsemiconductor layer, and a second positive electrode formed on the firstpositive electrode. The second positive electrode includes a layer of Auor Pt, which is in contact with the first positive electrode, in orderto enable a light-emitting layer located directly under the secondpositive electrode to emit light ([0012] and FIG. 1 of the related art1).

However, in the above related art 1, there is a problem that theelectrode layer may be separated (peeled) from the semiconductor layerdue to a difference in thermal expansion coefficient therebetween underhigh-temperature conditions such as reflowing, since the first andsecond positive electrodes are formed in continuous planar face.

SUMMARY OF THE INVENTION

It is an object of the invention to provide a solid-state element and asolid-state element device using the solid-state element that canprevent the separation of its electrode layer caused by a difference inthermal expansion coefficient.

-   (1) According to the invention, a solid-state element comprises:    -   a semiconductor layer formed on a substrate, the semiconductor        layer comprising a first layer that corresponds to an emission        area of the solid-state element to and a second layer through        which current is supplied to the first layer;    -   a light discharge surface through which light emitted from the        first layer is externally discharged, the light discharge        surface being located on the side of the substrate; and    -   an electrode comprising a plurality of regions that are of a        conductive material and are in ohmic-contact with the second        layer.

It is preferred that the plurality of regions are spread on the surfaceof the semiconductor layer, and the surface of the semiconductor layeris covered with the other conductive material with a thermal expansioncoefficient that is closer to the semiconductor layer than theelectrode.

The plurality of regions may be connected to each other.

It is preferred that the conductive material does not diffuse into thesemiconductor to make an intermetallic compound.

It is preferred that the semiconductor layer comprises a GaN basedsemiconductor compound.

It is preferred that the light discharge surface comprises an unevensurface formed by processing the substrate.

It is preferred that the light discharge surface comprises a convexportion, the conductive material is disposed according to the convexportion.

It is preferred that the convex portion comprises a high-refractiveresin layer formed on the semiconductor layer.

It is preferred that the substrate comprises a material with arefractive index substantially equal to the semiconductor layer.

-   (2) According to another aspect of the invention, a solid-state    element comprises:    -   a semiconductor layer formed on a substrate, the semiconductor        layer comprising a first layer that corresponds to an emission        area of the solid-state element to and a second layer through        which current is supplied to the first layer;    -   a light discharge surface through which light emitted from the        first layer is externally discharged, the light discharge        surface being located on the side of the substrate;    -   a contact electrode layer with a thermal expansion coefficient        substantially equal to the solid-state element; and    -   a joint portion that is, formed partially on the contact        electrode layer and is connected to an external wiring portion.

It is preferred that the joint portion comprises nickel (Ni) formed athick film.

It is preferred that the semiconductor layer comprises a light-emittinglayer to emit light based on current supplied thereto.

-   (3) According to another aspect of the invention, a solid-state    element device comprises:    -   a solid-state element;    -   a mount substrate on which the solid-state element is mounted,        the mount substrate having a thermal expansion coefficient        substantially equal to the solid-state element; and    -   an inorganic seal portion that seals the solid-state element,    -   wherein the solid-state element comprises a contact electrode        layer with a thermal expansion coefficient substantially equal        to the solid-state element, and a joint portion that is formed        partially on the contact electrode layer and is connected to an        external wiring portion.-   (4) According to another aspect of the invention, a solid-state    element device comprises:    -   a solid-state element comprising: a semiconductor layer formed        on a substrate, the semiconductor layer comprising a first layer        that corresponds to an emission area of the solid-state element        to and a second layer through which current is supplied to the        first layer; and a light discharge surface through which light        emitted from the first layer is externally discharged, the light        discharge surface being located on the side of the substrate;    -   a contact electrode layer with a thermal expansion coefficient        substantially equal to the solid-state element;    -   a joint portion that is formed partially on the contact        electrode layer and is connected to an external wiring portion.    -   a mount substrate on which the solid-state element is mounted,        the mount substrate having a thermal expansion coefficient        substantially equal to the solid-state element; and    -   an inorganic seal portion that seals the solid-state element.

It is preferred that the joint portion is formed partially on thecontact electrode layer.

It is preferred that the inorganic seal portion comprises a glassmaterial with a thermal expansion coefficient substantially equal to thesubstrate.

It is preferred that the contact electrode layer comprises a conductivemetal oxide such as ITO.

-   (5) According to another aspect of the invention, a solid-state    element device comprises:    -   a solid-state element;    -   a mount substrate on which the solid-state element is mounted,        the mount substrate being of an inorganic material with a        thermal expansion coefficient substantially equal to the        solid-state element; and    -   an inorganic seal portion that seals the solid-state element,    -   wherein the solid-state element comprises a contact electrode        layer that comprises a conductive metal oxide, and a joint        portion that is formed on the contact electrode layer and is        connected to a wiring portion formed on the mount substrate.

It is preferred that the conductive metal oxide comprises ITO.

BRIEF DESCRIPTION OF THE DRAWINGS

The preferred embodiments according to the invention will be explainedbelow referring to the drawings, wherein:

FIG. 1 is a cross sectional view showing a light emitting device as asolid-state element device in a first preferred embodiment according tothe invention;

FIG. 2 is a cross sectional view showing an LED element in FIG. 1;

FIG. 3A is a bottom view showing the LED element in FIG. 2 viewed froman electrode forming surface of the LED element;

FIG. 3B is a cross sectional view cut along a line A-A in FIG. 2;

FIG. 3C is a bottom view showing a modification of a p-multiplayerelectrode 27 in FIG. 3B;

FIG. 4 is a cross sectional view showing an LED element in a secondpreferred embodiment according to the invention;

FIG. 5A is a cross sectional view showing a modification (lightdischarge structure) of the LED element in FIG. 4;

FIG. 5B is a top view showing the LED element in FIG. 5A viewed from aposition B in FIG. 5A;

FIG. 6A is a cross sectional view showing an LED element in a thirdpreferred embodiment according to the invention;

FIG. 6B is a top view showing the LED element in FIG. 6A viewed from aposition B in FIG. 6A;

FIG. 7A is a cross sectional view showing an LED element in a fourthpreferred embodiment according to the invention;

FIG. 7B is a top view showing the LED element in FIG. 7A viewed from aposition B in FIG. 7A;

FIG. 8 is a cross sectional view showing an LED element in a fifthpreferred embodiment according to the invention;

FIG. 9A is a bottom view showing an LED element (viewed from itselectrode forming surface) in a sixth preferred embodiment according tothe invention;

FIG. 9B is a cross sectional view cut along a line C-C in FIG. 9A;

FIG. 10 is a bottom view showing an LED element (viewed from itselectrode forming surface) in a seventh preferred embodiment accordingto the invention;

FIG. 11A is a cross sectional view showing an LED element (mounted on anAl₂O₃ substrate 32) in an eighth preferred embodiment according to theinvention;

FIG. 11B is a plain view showing the Al₂O₃ substrate 32 in FIG. 11A witha circuit pattern formed thereon;

FIG. 12A is a cross sectional view showing an LED element in a ninthpreferred embodiment according to the invention;

FIG. 12B is a plain view showing the LED element in FIG. 12A;

FIG. 12C is a diagram illustrating critical angles;

FIG. 13 is a cross sectional view showing an LED element (mounted on anAl₂O₃ substrate 32) in a tenth preferred embodiment according to theinvention;

FIG. 14 is a plain view showing an LED element (viewed from itselectrode forming surface) in an eleventh preferred embodiment accordingto the invention; and

FIG. 15 is a plain view showing an LED element (viewed from itselectrode forming surface) in a twelfth preferred embodiment accordingto the invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First Embodiment

(Composition of Light Emitting Device 1)

FIG. 1 is a cross sectional view showing a light emitting device as asolid-state element device in the first preferred embodiment accordingto the invention.

The light emitting device 1 is composed of: a flip-chip type LED element2 as a solid-state element that is of GaN based semiconductor; an Al₂O₃substrate 3 on which the LED element 2 is mounted; a circuit pattern 4that is composed of tungsten (W)/nickel (Ni)/gold (Au) and is formed onthe Al₂O₃ substrate 3; an Au stud bump 5 that is formed as a jointportion to connect between the LED element 2 and the circuit pattern 4;and a glass seal material 6 that seals the LED element 2 and is bondedto the Al₂O₃ substrate 3.

The Al₂O₃ substrate 3 is provided with a via hole 3A to electricallyconnect between the circuit patterns 4 that are of W—Ni and metallizedat the front surface and back surface of the substrate 3.

The glass seal material 6 is of low-melting glass and is formedrectangular with a top face 6A and a side face 6B by cutting by a dicerafter hot-pressed using a mold to be bonded to the Al₂O₃ substrate 3.

(Composition of the LED Element 2)

FIG. 2 is a cross sectional view showing an LED element in FIG. 1.

The LED element 2 is composed of: a sapphire (Al₂O₃) substrate 20; andsequentially grown on the sapphire substrate 20, an AlN buffer layer 21,an n-GaN cladding layer 22, a multilayer 23 including a light-emittinglayer, a p-AlGaN cladding layer 24, and a p-GaN contact layer 25.Further, it is provided with a n-electrode 26 that is formed on part ofthe n-GaN cladding layer 22 exposed by removing the p-GaN contact layer25 through the n-GaN cladding layer 22 by etching, and a p-multiplayerelectrode 27 that is formed on the surface of the p-GaN contact layer25.

(Composition of the p-Multiplayer Electrode 27)

The p-multiplayer electrode 27 is composed of: a rhodium (Rh) layer 27Athat is formed a lattice on the surface of the p-GaN contact layer 25; atungsten (W) layer 27B that is formed on the surface of the p-GaNcontact layer 25 and the rhodium (Rh) layer 27A; and an Au layer 27Cthat is formed on the surface of the tungsten (W) layer 27B.

(Fabrication of the LED Element 2)

In fabricating the LED element 2, the sapphire substrate 20 as a waferis first provided. Then, formed on the sapphire substrate 20 by a knownmethod are the AlN buffer layer 21, the n-GaN cladding layer 22, themultilayer 23 including a light-emitting layer, the p-AlGaN claddinglayer 24, the p-GaN contact layer 25, and the n-electrode 26.

Then, the rhodium (Rh) layer 27A is formed on the surface of the p-GaNcontact layer 25 by deposition. Then, a photoresist is formed on thesurface of the rhodium (Rh) layer 27A. Then, a resist mask in a latticeform is disposed on the photoresist and the photoresist is exposed.Then, exposed part of the rhodium (Rh) layer 27A is removed by etching.Then, the resist mask is removed from the surface of thelattice-patterned rhodium (Rh) layer 27A. Then, the tungsten (W) layer27B is formed thereon by deposition to cover the lattice-patternedrhodium (Rh) layer 27A. Then, the Au layer 27C is formed on the tungsten(W) layer 27B by deposition. Then, the sapphire substrate 20 with theGaN based semiconductor layers is diced into 0.3 mm×0.3 mm. Thus, theLED element 2 is obtained.

(p-Multiplayer Electrode 27)

FIG. 3A is a bottom view showing the LED element in FIG. 2 viewed fromthe electrode forming surface of the LED element. FIG. 3B is a crosssectional view cut along the line A-A in FIG. 2. FIG. 3C is a bottomview showing a modification of the p-multiplayer electrode 27 in FIG.3B.

The p-multiplayer electrode 27 is, as shown in FIG. 3A, covered with theAu layer 27C formed on the surface. The lattice-patterned rhodium (Rh)layer 27A surrounded by the tungsten (W) layer 27B is formed under theAu layer 27C as shown in FIG. 3B. The lattice-patterned rhodium (Rh)layer 27A is composed of a plurality of regions formed in rectangulardots. The regions emit light when current is supplied through the Aulayer 27C.

The lattice-patterned rhodium (Rh) layer 27A may be formed such that theregions are connected with each other as shown in FIG. 3C. Theconnection form may be such that part of the regions is connectedregularly or irregularly.

(Fabrication of the Light Emitting Device 1)

First, the Al₂O₃ substrate 3 with the via hole 3A is provided. Atungsten (W) paste is screen-printed on the surface of the Al₂O₃substrate 3 according to the circuit pattern 4. Then, the Al₂O₃substrate 3 with the tungsten paste printed thereon is heat-treated at1000° C. or higher so as to bond the tungsten onto the substrate 3.Then, Ni plating and Au plating are formed on the tungsten to make thecircuit pattern 4. Then, the LED element 2 is electrically connectedthrough the Au stud bump 5 to the circuit pattern 4 on the front surfaceof the Al₂O₃ substrate 3. Then, a low-melting glass plate is placedparallel to the Al₂O₃ substrate 3 with the LED element 2 mountedthereon, and the hot pressing is conducted at a pressure of 60 kgf and atemperature of 600° C. in a nitrogen atmosphere. The low-melting glassis bonded to the Al₂O₃ substrate 3 through oxides contained therein.Then, the Al₂O₃ substrate 3 integrated with the low-melting glass isdiced by a dicer, and thereby the rectangular light emitting device 1 isseparated.

(Operation of the Light Emitting Device 1)

When a voltage is applied by connecting the circuit pattern 4 to a powersource (not shown), the LED element 2 emits blue light with a wavelengthof 460 nm while having light emitted in planar form inside themultilayer 23. The blue light enters into the sapphire substrate 20 fromthe multilayer 23 through the n-GaN cladding layer 22 and the AlN bufferlayer 21, entering into the glass seal material 6 from the sapphiresubstrate 20, externally discharged from the top face 6A and the sideface 6B.

(Effects of the First Embodiment)

In the first embodiment explained above, the lattice-patterned rhodium(Rh) layer 27A is formed on the surface of the p-GaN contact layer 25.Thereby, the p-GaN contact layer 25 can be ohmic-contacted with thep-multiplayer electrode 27 and a good bonding property can be obtainedtherebetween.

Further, the rhodium (Rh) layer 27A is lattice-patterned and thetungsten with a thermal expansion coefficient of about 5×10⁻⁶/° C.,which is equal to that of GaN based layers (the p-AlGaN cladding layer24, the p-GaN contact layer 25) of the LED element 2 as compared to athermal expansion coefficient of 8×10⁻⁶/° C. of rhodium, is formed.Thereby, a thermal stress caused by a difference in thermal expansioncoefficient from the Au layer (15×10⁻⁶/° C.) with the biggest thermalexpansion coefficient in the components can be reduced. Therefore, theseparation (peeling) of the electrode layer can be prevented even underhigh-temperature conditions such as glass sealing and reflowing. Thus,the stable flow of current into the multilayer 23 can be performed.

Further, by mounting the LED element 2 on the Al₂O₃ substrate 3 with athermal expansion coefficient equal to the LED element 2, a thermalstress caused by a difference in thermal expansion coefficient betweenthe LED element 2 and the Al₂O₃ substrate 3 can be reduced. In thisembodiment, since the LED element 2 is constructed such that the GaNbased layers are formed on the sapphire substrate 20 (with a thermalexpansion coefficient of 7×10⁻⁶/° C.), the entire thermal expansioncoefficient of the LED element 2 can be deemed equal to the sapphiresubstrate 20. By thus reducing the stress, the separation therebetweencan be prevented even under high-temperature conditions such as glasssealing.

Although in the first embodiment the rhodium (Rh) layer 27A islattice-patterned, it may be also formed a mesh or a dotted patternother than the modification as shown in FIG. 3C. The other electrodematerial for ohmic contact may be chromium (Cr) with a large bondingstrength. The patterning structure is especially effective in the ohmicelectrode for the GaN based semiconductor layers since they cannot havea sufficient bonding strength as GaAs or AlInGaP based semiconductors,where its electrode element diffuses into the semiconductor layer and anintermetallic compound is formed therebetween. The patterning structureis also effective for the other semiconductor where the electrodematerial is unlikely to diffuse into the semiconductor layer. The sameeffect can be obtained even when the electrode material is likely todiffuse into the semiconductor layer.

It is preferred that the electrode material such as rhodium is depositedby sputtering rather than electron beam deposition, which is sufficient,so as to enhance the bonding strength to the surface of GaN basedsemiconductors.

(Modification of the First Embodiment)

A modification of the light emitting device 1 may be a wavelengthconversion type light emitting device that a phosphor-containing epoxyresin is used as a seal material in place of the glass seal material 6.The phosphor can be, for example, Ce:YAG (yttrium aluminum garnet). Inthis case, the phosphor is excited by light of 460 nm to radiate ayellow excited light of 520 to 550 nm. The yellow excited light is mixedwith the blue light to generate a white light.

Second Embodiment

(Composition of LED Element 2)

FIG. 4 is a cross sectional view showing an LED element in the secondpreferred embodiment according to the invention.

The LED element 2 of the second embodiment is different from the firstembodiment in that a GaN substrate 28 (with a refractive index of n=2.4)is used in place of the sapphire substrate 20 and a Bi basedhigh-refractive index glass with a refractive index of 1.85 is used. TheGaN substrate 28 is provided with a slope 28A formed by removing thecorner portion by cutting or polishing etc. In this embodiment, likeparts are indicated by the same numerals as used in the firstembodiment.

(Effects of the Second Embodiment)

In the second embodiment, adding to the effects of the first embodiment,due to using the GaN substrate 28, the light generated in the multilayer23 can reach the interface between the GaN substrate 28 and the glassseal material (not shown in FIG. 4) without having an optical loss.Further, since the seal material has a high refractive index and the LEDelement 2 is not rectangular but formed with the slope 28A, lightconfined in the LED element 2 can be reduced. Thereby, the externalradiation efficiency of the LED element 2 can be enhanced significantly.Also, due to the slope 28A formed on the GaN substrate 28, blue lightemitted from the multilayer 23 in the direction of the p-multiplayerelectrode 27 and reflected on the p-multiplayer electrode 27 can bedischarged externally. Thus, the external radiation efficiency can beenhanced.

Further, since the seal material of the LED element 2 is made of glass,the seal material does not deteriorate due to light or heat generatedfrom the LED element 2 and a high-refractive index characteristic can beobtained. In case of the hard seal material of glass, a crack due to thethermal stress is likely to occur as compared to resins. However, evenwhen a heat contraction of glass in cooling after the device sealingcauses a big internal stress, the slope 28A can prevent the localizationof stress in the glass. Thus, the light emitting device 1 can preventthe package crack to offer a good reliability.

(Modification)

FIG. 5A is a cross sectional view showing a modification (lightdischarge structure) of the LED element in FIG. 4. FIG. 5B is a top viewshowing the LED element in FIG. 5A viewed from a position B in FIG. 5A.

The LED element 2 is provided with a convex portion 22A that a groove 22a is formed on the surface of the GaN substrate 28 by cutting. Also, theGaN substrate 28 is provided with a slope 28B formed by cutting thecorner portion by cutting or polishing etc. Further, a continuous Aglayer 27D is formed in the p-multiplayer electrode 27 instead of thetungsten layer 27B.

In the LED element 2 thus formed, since the GaN substrate 28 has theuneven light discharge surface, the area of the light discharge surfaceincreases. Thereby, the light discharge characteristic of the LEDelement 2 can be enhanced. Also, blue light emitted form the multilayer23 in the direction of the p-multiplayer electrode 27 and reflected onthe p-multiplayer electrode 27 can be well discharged externally. Thus,the external radiation efficiency can be enhanced.

Third Embodiment

(Composition of LED Element 2)

FIG. 6A is a cross sectional view showing an LED element in the thirdpreferred embodiment according to the invention. FIG. 6B is a top viewshowing the LED element in FIG. 6A viewed from a position B in FIG. 6A.

The LED element 2 is composed of the GaN substrate 28 with the groove 22a formed by cutting on the light discharge surface as explained in FIG.5A, and the p-multiplayer electrode 27 with the tungsten (W) layer 27Blattice-patterned.

(Effects of the Third Embodiment)

In the third embodiment, due to the lattice-patterned tungsten (w) layer27B, the separation of the electrode layer can be prevented. Inaddition, the p-GaN has a high resistivity, which allows the formationof an emission area according to the pattern of ohmic electrodes, andthe uneven surface is formed according to the emission area. Therefore,the light discharge characteristic from the GaN based semiconductorlayer can be enhanced.

Fourth Embodiment

(Composition of LED Element 2)

FIG. 7A is a cross sectional view showing an LED element in the fourthpreferred embodiment according to the invention. FIG. 7B is a top viewshowing the LED element in FIG. 7A viewed from a position B in FIG. 7A.

The LED element 2 of the fourth embodiment is different from the firstembodiment in that the sapphire substrate 20 is separated from the LEDelement 2 of the first embodiment by using a laser light and, instead, athermosetting resin layer 29 with a refractive index of n=2.1 is formed100 μm thick on the surface of the n-GaN cladding layer 22.

The thermosetting resin layer 29 is provided with a convex portion 29Athat hexagonal convex faces are zigzag-patterned. Further, the rhodium(Rh) layer 27A is formed into hexagonal portions (or islands)zigzag-patterned on the p-GaN contact layer 25. As shown in FIG. 7B, theconvex portion 29A (hexagonal convex faces) of the thermosetting resinlayer 29 is arranged according to the rhodium (Rh) layer 27A (hexagonalislands).

The thermosetting resin layer 29 is formed such that a sheet ofthermosetting resin is previously patterned by molding such as pressmolding according to the hexagonal convex faces of the convex portion29A, and the patterned sheet is bonded onto the surface of the n-GaNcladding layer 22.

Alternatively, instead of using the sheet of thermosetting resin, thethermosetting resin layer 29 may be formed on the surface of the n-GaNcladding layer 22 by injecting the thermosetting resin into a mold. Inthis case, the mold is provided with the pattern according to thehexagonal convex faces of the convex portion 29A.

The LED element 2 with the thermosetting resin layer 29 thus formed issealed with silicone resin.

(Effects of the Fourth Embodiment)

In the fourth embodiment, the thermosetting resin layer 29 with arefractive index near to the GaN based semiconductor layer is used andthe thermosetting resin layer 29 is provided with the convex portion29A. Thereby, the light discharge surface with the high refractive indexand the enlarged surface area can be easily formed without requiring anyprocess such as cutting and polishing on the surface of the n-GaNcladding layer 22.

Also, since the convex portion 29A (hexagonal convex faces) of thethermosetting resin layer 29 is arranged according to the rhodium (Rh)layer 27A (hexagonal islands), blue light emitted from the multiplayer23 directly over the rhodium (Rh) layer 27A can reach the lightdischarge surface with the enlarged area. Thereby, externallydischargeable light increases as compared to the case that the light isdischarged from a planar light discharge surface.

The convex portion 29A may be formed as shown in FIG. 5B, and the convexface may be curved. The convex faces may be arranged in another patternother than the zigzag pattern.

The thermosetting resin layer 29 may be provided with a roughenedsurface that allows the surface area larger than a planar surface,instead of using the convex portion 29A.

Fifth Embodiment

(Composition of LED Element 2)

FIG. 8 is a cross sectional view showing an LED element in the fifthpreferred embodiment according to the invention.

The LED element 2 of the fifth embodiment is different from the fourthembodiment in that the p-multiplayer electrode 27 is constructed suchthat the Ag layer 27D and the Au layer 27C are, as separate electroderegions, formed in a lattice pattern as well as the rhodium (Rh) layer27A.

The rhodium (Rh) layer 27A has such a small thickness that allows thetransmission of light emitted from the multiplayer 23 such that thetransmitted light is reflected on the Ag layer 27D with a goodreflection efficiency.

(Effects of the Fifth Embodiment)

In the fifth embodiment, adding to the effects of the fourth embodiment,the thermal stress caused by a difference in thermal expansioncoefficient between the p-multiplayer electrode 27 and the GaN basedsemiconductor layer can be reduced. Therefore, the separation (peeling)of the electrode layer can be prevented even under high-temperatureconditions such as glass sealing and reflowing. Thus, the stable flow ofcurrent into the multilayer 23 can be performed.

Further, by setting the reflectivity at the electrode layer to bebetween the rhodium (Rh) layer 27A and the Ag layer 27D, thereflectivity can be enhanced. Thereby, the external radiation efficiencycan be enhanced.

Sixth Embodiment

(Composition of LED Element 2)

FIG. 9A is a bottom view showing an LED element (viewed from itselectrode forming surface) in the sixth preferred embodiment accordingto the invention. FIG. 9B is a cross sectional view cut along the lineC-C in FIG. 9A.

The LED element 2 is, as shown in FIG. 9A, provided with an n-electrode26 made of Ti/Pt, a p-contact electrode layer 30 as a p-contactelectrode made of ITO (indium tin oxide) with a thermal expansioncoefficient substantially equal to the LED element 2 (of GaN basedsemiconductor), and Au pad electrodes 31 formed partially on then-electrode 26 and the p-contact electrode layer 30. The LED element 2sizes about 300 μm square. The ITO is thinly formed by EB (electronbeam) deposition.

FIG. 9B shows in partially enlarged view the case that the LED element 2of the sixth embodiment is applied to the light emitting device 1 of thefirst embodiment as shown in FIG. 1. In the sixth embodiment, thecircuit pattern 4 is made of W/Ni/Ag on the device mounting side and ofW/Ni/Au on the back side of the substrate 32, where both sides of thecircuit pattern 4 are connected through the tungsten (W) pattern in thevia hole 3A. The Au pad electrode 31 has substantially the same size asthe Au stud bump 5.

In the sixth embodiment, the LED element 2 is mounted on the circuitpattern 4 by thermocompression with ultrasonic of the Au stud bump 5,and sealed with a low-melting glass with a thermal expansion coefficientof 7×10⁻⁶/° C.

(Effects of the Sixth Embodiment)

In the sixth embodiment, the Au pad electrode 31 is formed partially onthe p-contact electrode layer 30 with a thermal expansion coefficientsubstantially equal to the LED element 2, and the LED element 2 ismounted through the Au stud bump 5 on the circuit pattern 4 of the Al₂O₃substrate 32 with a thermal expansion coefficient substantially equal tothe LED element 2 and sealed with glass. Therefore, the p-contactelectrode layer 30 is unlikely to be separated from the GaN basedsemiconductor layer 200, and the thermal stress can be absorbed whileallowing the thermal deformation of the Au pad electrode 31 and the Austud bump 5.

In experiments by the inventors, the LED element 2 is mounted onsubstrates with different thermal expansion coefficients, i.e., an Al₂O₃substrate and a glass-containing Al₂O₃ substrate (with a thermalexpansion coefficient of 12×10⁻⁶/° C.), and sealed with glass. As aresult, comparing to the Al₂O₃ substrate, it is confirmed that some ofthe glass-containing Al₂O₃ substrates cause an increase (0.3 V inaverage) in forward voltage caused by the separation of the electrodeand a defect in the emission pattern. Thus, since the LED element 2 hasa thermal expansion coefficient substantially equal to the Al₂O₃substrate 32, the thermal stress caused by a difference in thermalexpansion coefficient therebetween is not generated even at a hightemperature, i.e., 500 to 600° C., in the glass sealing. Therefore, thegood-quality glass-sealed LED can be obtained and the yield can beenhanced.

In order to have a good forward voltage and emission pattern withouthaving the electrode separation in the LED element 2 with such a size,it is desired that the mount substrate 32 has a thermal expansioncoefficient, i.e., 5×10⁻⁶ to 10×10⁻⁶/° C., substantially equal to theLED element 2 (7×10⁻⁶/° C.).

Further, since the Au pad electrode 31 is formed partially formed on thep-multiplayer electrode 27, the thermal stress generated can be reduced.Also, the thermal stress generated in the mounting can be reduced bymounting the LED element 2 on the substrate with a thermal expansioncoefficient substantially equal thereto.

Further, the ITO electrode (p-contact electrode layer 30) has a bondingforce to GaN greater than rhodium (Rh) and therefore the separation bythe stress is unlikely to occur. Thus, the good-quality glass-sealed LEDcan be stably produced.

In the glass sealing, a glass material with a relatively high viscosityat a high temperature is press-bonded onto the Al₂O₃ substrate. Thereby,an electric interconnecting means such as an Au wire may be collapsedcausing an electrical disconnection or a short-circuiting. In order toprevent this, the LED element 2 is flip-chip mounted and the ITOelectrode 30 of the LED element 2 is formed on the side of the mountsubstrate 32. Although the ITO electrode 30 is known as a transparentelectrode that allows an enhancement in light discharge, it is used inthe invention because it has a thermal expansion coefficient(7.7˜8.5×10⁻⁶/° C.) substantially equal to the LED element 2 and a largebonding force to GaN. Therefore, due to the ITO, the separation of theelectrode is unlikely to occur even in the glass sealing at atemperature higher than 500° C.

Alternatively, the electrode material may be AZO(ZnO:Al), IZO(In₂O₃—ZnO,90-10 wt %) other than the ITO. Further, the other conductive metaloxides can be used that has properties as the contact electrode layerand a thermal expansion coefficient substantially equal to the LEDelement 2, and has such a bonding force to the semiconductor layer thatcan prevent the separation of the electrode.

Although in the above embodiments the LED element 2 is formed such thatthe GaN based layers are grown on the sapphire substrate (with a thermalexpansion coefficient of 7×10⁻⁶/° C.), it may be formed such that theGaN based layers are grown on a SiC or GaN substrate (with a thermalexpansion coefficient of 5×10⁻⁶/° C.) and the ITO is formed thereon asthe p-contact electrode layer 30.

Although in the sixth embodiment the ITO is used as the contactelectrode layer with a thermal expansion coefficient equal to thedevice, rhodium (Rh) (with a thermal expansion coefficient of 8×10⁻⁶/°C.) may be used in place of the ITO. In case of using Rh, the lightdischarge characteristic can be enhanced since it also serves as a lightreflection layer. Alternatively, an Au/Co film can be used on which apassivation film of SiO₂ or SiN etc. is formed to protect the periphery.

In experiments by the inventors, it is confirmed that the separation ofelectrode is not generated when the LED element 2 not mounted on themounting substrate is subjected to heat treatment at 600° C. in theconventional structure that the Rh layer is formed on the entire surfaceof the p-GaN contact layer 25 and the Au layer for a bonding pad isformed on the entire surface of the Rh layer. However, when the LEDelement 2 is mounted on the glass-containing Al₂O₃ substrate and sealedwith glass, due to the thermal stress generated in the mounting, it isdifficult to prevent surely the separation of the electrode layer.Therefore, if the bonding force to the p-GaN contact layer 25 is smalland the difference of thermal expansion coefficient is large, it isrequired that the Au layer for a bonding pad is partially formed in asize as needed and the mounting substrate has a thermal expansioncoefficient substantially equal to the LED element 2.

The Au pad electrode 31 may be made of Ag other than Au. Thereby, thelight absorption by the pad electrode can be reduced.

Seventh Embodiment

(Composition of LED Element 2)

FIG. 10 is a bottom view showing an LED element (viewed from itselectrode forming surface) in the seventh preferred embodiment accordingto the invention.

The LED element 2, which is a large sized chip of 1000 μm square, isprovide with an n-electrode 26 composed of a plurality of Au padelectrodes 31 formed on the n-GaN cladding layer 22, and a p-contactelectrode layer 30 that is made of ITO and on which a plurality of Aupad electrodes 31 are formed thereon.

Then-electrode 26 is formed like a comb interposed between stripes ofthe p-contact electrode layer 30 so as to enhance the current spreadingproperty to the p-GaN layer, and has the two Au pad electrodes 31 formedthereon.

The p-contact electrode layer 30 is formed in a region except then-electrode 26, and it has the eighteen Au pad electrodes 31 formedthereon at given intervals.

(Effects of the Seventh Embodiment)

In the seventh embodiment, even in the large sized LED element 2significantly affected by the thermal stress as compared to a normalsize LED element 2, the p-contact electrode layer 30 is unlikely to beseparated from the GaN based semiconductor layer 200 like the sixthembodiment. Therefore, an uniform emission can be obtained withoutgenerating an unevenness in emission within the emission region.

Eighth Embodiment

(Composition of LED Element 2)

FIG. 11A is a cross sectional view showing an LED element (mounted on anAl₂O₃ substrate 32) in the eighth preferred embodiment according to theinvention. FIG. 11B is a plain view showing the Al₂O₃ substrate 32 inFIG. 11A with a circuit pattern formed thereon.

In the eighth embodiment, as shown in FIG. 11A, a thick-film portion 4Aof Ni is, by electroless deposition, formed 15 μm thick integrated withthe circuit pattern 4 formed on the Al₂O₃ substrate 32. The thick-filmportion 4A is provided with a 0.5 μm thick Au layer (not shown) formedon the Ni surface thereof.

Meanwhile, the LED element 2 is not provided with the Au stud bump 5.The other components are the same as in the sixth embodiment and theexplanations thereof is omitted.

(Effects of the Eighth Embodiment)

In the eighth embodiment, the thick-film portion 4A of Ni formed byelectroless deposition in place of the Au stud bump 5 is integrated withthe circuit pattern 4. Therefore, adding to the effects of the sixthembodiment, the joint portion can be integrally formed. Especially whenthe multiple joint portions are used as shown in FIG. 11B, thepositioning or posture control of the joint portions to a devicemounting region 210 can be made easier as well as eliminating theprocess of forming the Au stud bump 5. Thus, the mass productivity ofthe light emitting device 1 can be enhanced.

Ninth Embodiment

(Composition of LED Element 2)

FIG. 12A is a cross sectional view showing an LED element in the ninthpreferred embodiment according to the invention. FIG. 12B is a plainview showing the LED element in FIG. 12A. FIG. 12C is a diagramillustrating critical angles.

The flip-chip type LED element 2 is, as shown in FIG. 12A, composed of:the sapphire substrate 20; an n-GaN layer 201 made of a GaN basedsemiconductor compound; a light-emitting layer 202 formed on the n-GaNlayer 201; a p-GaN layer 203; an n-electrode 26 that is formed on partof the n-GaN layer 201 exposed by removing the p-GaN layer 203 throughthe n-GaN layer 201 by etching; ITO (indium tin oxide) 240 that isformed on the p-GaN layer 203 and has a refractive index (n=1.8) lowerthan the GaN based semiconductor (n=2.4); and a p-Rh electrode 205 madeof rhodium with a high-refractive index. The n-GaN layer 201, thelight-emitting layer 202 and the p-GaN layer 203 compose the GaN basedsemiconductor layer 200. An Au pad electrode layer (not shown) forbump-bonding in the mounting is partially formed on a given bondingposition of the p-Rh electrode 205.

In the ninth embodiment, the sapphire substrate 20 serves as a lighttransmitting portion that has a light transmission characteristic to anemission wavelength of blue light emitted from the light-emitting layer202. The ITO 204 and the p-Rh electrode 205 are disposed on the mountingsurface side located under the light-emitting layer 202 and compose alight reflection portion where the end face of the LED element 2 isexposed. The ITO 204 functions as a conductive total-reflection layerwhile having a light transmitting characteristic.

The GaN based semiconductor layer can be formed by the known method,i.e., metalorganic chemical vapor deposition (MOCVD), molecular beamepitaxy (MBE), hydride vapor phase epitaxy (HVPE), sputtering, ionplating, electron shower etc. The LED element 2 can be formed as ahomo-, hetero- or double hetero-structure. The LED element 2 can includequantum well structure (single- or multi-quantum well structure).

FIG. 12B is a plain view showing the LED element 2, where FIG. 12Acorresponds to a cross section cut along a line D-D. As shown, the p-Rhelectrode 205 is formed surrounding the n-electrode 26 and thelight-emitting layer 202 emits light in the region where the p-Rhelectrode 205 is formed.

FIG. 12C is a diagram showing the behavior of blue light inside the GaNbased semiconductor layer 200 of the ninth embodiment. Of light emittedfrom the light-emitting layer 202 in the GaN based semiconductor layer200, a light component to enter into the interface between the sapphiresubstrate 20 and the GaN based semiconductor layer 200 at an anglegreater than a critical angle based on the difference of refractiveindexes thereof is not externally radiated and retained in the GaN basedsemiconductor layer 200 as a light propagated in the layer direction.The light propagated in the layer direction is propagated whilereflected between the ITO 204 and the sapphire substrate 20 or betweenthe p-Rh electrode 205 and the sapphire substrate 20. Most of the lightis propagated in the layer direction without reaching the p-Rh electrode205 due to the ITO 204.

(Effects of the Ninth Embodiment)

In the ninth embodiment, since the ITO 204 with a thermal expansioncoefficient equal to the semiconductor layer is disposed between thep-GaN layer 203 and the p-Rh electrode 205, the electrode layer isunlikely to be separated from the p-GaN layer 203.

Further, the light propagated in the layer direction that enters intothe interface at an angle greater than a critical angle based on therefractive index ratios of the GaN and ITO to the p-Rh electrode 205 issubjected to the total reflection. Therefore, it does not reach the p-Rhelectrode 205 and is retained in the layer without being externallyradiated from the GaN based semiconductor layer 200. Thereby, the metalabsorption loss generated when the light propagated in the layerdirection is reflected on the p-Rh electrode 205 can be prevented. Thiscan prevent the attenuation of the light propagated in the layerdirection at the short distance.

Although in FIG. 12A the GaN layer is illustrated thick for theexplanation, it is in fact a thin film of several microns. Because ofthis, the light propagated in the layer direction has a great averagenumber of reflections. Even when a metal with a high reflectivity of 90%is used, the influence by absorption loss must be much. Thus, theabsorption loss can be significantly reduced.

As such, the light propagated in the layer direction reflected betweenthe sapphire substrate 20 and the ITO 204 can be externally radiatedfrom the side face of the LED element 2. The external radiationefficiency can be thus enhanced.

Although in the ninth embodiment the ITO 204 of transparent dielectricis disposed as a low-refractive index layer between the GaN basedsemiconductor layer 200 and the p-Rh electrode 205, the otherlow-refractive index layer such as InGaN (n=2.1), In₂O₃—SnO₂:90-10 wt %,and AZO(ZnO:Al)-IZO(In₂O₃—ZnO):90-10 wt % may be used. However, it ispreferred that a lower-refractive index material is chosen so as toincrease the light propagated in the layer direction based on the totalreflection.

The ITO has a bonding force to the GaN greater than the Rh. Further, thesurface of the ITO formed is roughened. Therefore, the bonding force ofthe Rh to the ITO increases.

Therefore, the separation of the electrode layer is more unlikely tooccur as compared to the Rh layer directly bonded to the GaN.

Also, the high-reflectivity material used as the p-electrode is notlimited to the Rh, and the other material such as Ag may be used.However, it should be noted that the film thickness is not increasedmore than necessary in the case of a material with a large thermalexpansion coefficient.

Alternatively, when the mount surface for the flip-chip mounting of theLED element 2 has a high reflectivity, the high-reflectivity materialmay be omitted without using the above combination of the transparentdielectric and the high-reflectivity material. For example, in the caseof GaAs based compound semiconductor, a Bragg reflection film composedof a multilayer with different refractive-index materials can be usedwhen the high-reflectivity material is omitted.

Although in the ninth embodiment the LED element 2 is composed of theGaN based semiconductor layer 200 grown on the sapphire substrate 20,the LED element 2 may have a GaN substrate or the sapphire substrate 20may be lifted off after the growth of he GaN based semiconductor layer200. Even in the case of lifting off the sapphire substrate 20, it issubstantially included in the form that the semiconductor layer isformed on the sapphire substrate 20 and light emitted from acorresponding light-emitting layer is externally discharged. Further,the LED element 2 may be made of a material other than GaN.

Tenth Embodiment

(Composition of LED Element 2)

FIG. 13 is a cross sectional view showing an LED element (mounted on anAl₂O₃ substrate 32) in the tenth preferred embodiment according to theinvention.

In this embodiment, instead of the Au stud bump 5 used in the sixthembodiment, a Ni layer 33 is formed 15 μm thick by electroless platingon the circuit pattern 4 formed on the surface of the Al₂O₃ substrate32. An Au layer (not shown) is formed 0.5 μm thick on the surface of theNi layer 33.

(Effects of the Tenth Embodiment)

In the tenth embodiment, since the thick Ni layer 33 is integrallyformed by electroless plating on the side of the LED element 2, thethick portion can be easily made according to the shape of then-electrode 26 and the p-contact electrode layer 30. Thereby, theperformance of fabrication can be enhanced. Also, the mounting propertycan be enhanced by the Ni layer 33 formed on the side of the LED element2 where a high precision is needed in positioning the circuit pattern 4and the LED element 2. Thereby, the yield can be enhanced.

Eleventh Embodiment

(Composition of LED Element 2)

FIG. 14 is a plain view showing an LED element (viewed from itselectrode forming surface) in the eleventh preferred embodimentaccording to the invention.

In the eleventh embodiment, an n-electrode 26 is formed radially fromthe center of the LED element 2, and the p-contact electrode layer 30 isformed on the p-GaN layer surrounding the n-electrode 26. The Ni layer33 explained in the ninth embodiment is formed on the n-electrode 26 andthe p-contact electrode layer 30. The n-electrode 26 is formed radiallyon part of the n-GaN layer exposed by removing the p-GaN layer byetching in the diagonal direction of the electrode forming surface.Thereby, the current spreading property to the p-GaN layer can beenhanced.

(Effects of the Eleventh Embodiment)

In the eleventh embodiment, adding to the effects of the ninthembodiment, the current spreading property can be enhanced by then-electrode 26 formed radially from the center of the LED element 2.

The Ni layer 33 formed by electroless plating has a degree of freedom inits dimensions. Therefore, the mounting pad electrodes (the Ni layer 33)can be formed at a suitable position and in a suitable form even whenthe electrode pattern is formed as described above. In detail, then-electrode pad 33 is disposed at the center of the LED element 2, andthe p-electrode pads 33 are disposed on four sites of the p-contactelectrode layer 30 so as to have the stability in the mounting, and theyare downsized so as to prevent the short-circuit to the n-electrode 26formed radially even when deformed slightly in the mounting.

Twelfth Embodiment

(Composition of LED Element 2)

FIG. 15 is a plain view showing an LED element (viewed from itselectrode forming surface) in the twelfth preferred embodiment accordingto the invention.

In the twelfth embodiment, the Ni layer 33 is formed on the n-electrode26, and a plurality of rectangular (or square) Ni layers 33 are, atgiven intervals like islands, formed on the p-contact electrode layer 30except the n-electrode 26.

(Effects of the Twelfth Embodiment)

In the twelfth embodiment, adding to the tenth embodiment, the bondingarea of the p-contact electrode layer 30 to the circuit pattern 4 can beincreased. Thereby, the current-carrying property and the heat radiationproperty of the LED element 2 can be enhanced. In this case, since theNi layer 33 (mounting pads) with a large thermal expansion coefficientis formed not continuously but like islands relative to the othercomponents, the thermal stress generated at a high temperature can bereduced.

The solid-state element devices as explained above are applied to thelight emitting device 1 using the LED element 2 as a solid-stateelement. However, the solid-state element or the solid-state elementdevice of the invention is not limited to the light emitting device 1.For example, it may be applied to a solid-state element device that alight-receiving element as a solid-state element is mounted on asubstrate and sealed with glass. The seal material is not limited to atransparent material and may be an inorganic material that is slightlyclouded by crystallization as well as having a light transmittingcharacteristic. Further, it may be a resin material other than theinorganic material if it can endure at a temperature where a thermalstress such as reflowing can be a problem.

Although the invention has been described with respect to the specificembodiments for complete and clear disclosure, the appended claims arenot to be thus limited but are to be construed as embodying allmodifications and alternative constructions that may occur to oneskilled in the art which fairly fall within the basic teaching hereinset forth.

1. A solid-state element, comprising: a semiconductor layer formed on a substrate, the semiconductor layer comprising a first layer that corresponds to an emission area of the solid-state element to and a second layer through which current is supplied to the first layer; a light discharge surface through which light emitted from the first layer is externally discharged, the light discharge surface being located on the side of the substrate; and an electrode comprising a plurality of regions that are of a conductive material and are in ohmic-contact with the second layer.
 2. The solid-state element according to claim 1, wherein: the plurality of regions are spread on the surface of the semiconductor layer, and the surface of the semiconductor layer is covered with the other conductive material with a thermal expansion coefficient that is closer to the semiconductor layer than the electrode.
 3. The solid-state element according to claim 1, wherein: the plurality of regions are connected to each other.
 4. The solid-state element according to claim 1, wherein: the conductive material does not diffuse into the semiconductor to make an intermetallic compound.
 5. The solid-state element according to claim 1, wherein: the semiconductor layer comprises a GaN based semiconductor compound.
 6. The solid-state element according to claim 1, wherein: the light discharge surface comprises an uneven surface formed by processing the substrate.
 7. The solid-state element according to claim 1, wherein: the substrate comprises a material with a refractive index substantially equal to the semiconductor layer.
 8. A solid-state element, comprising: a semiconductor layer formed on a substrate, the semiconductor layer comprising a first layer that corresponds to an emission area of the solid-state element to and a second layer through which current is supplied to the first layer; a light discharge surface through which light emitted from the first layer is externally discharged, the light discharge surface being located on the side of the substrate; a contact electrode layer with a thermal expansion coefficient substantially equal to the solid-state element; and a joint portion that is formed partially on the contact electrode layer and is connected to an external wiring portion.
 9. The solid-state element according to claim 8, wherein: the joint portion comprises nickel (Ni) formed a thick film.
 10. The solid-state element according to claim 8, wherein: the semiconductor layer comprises a light-emitting layer to emit light based on current supplied thereto.
 11. A solid-state element device, comprising: a solid-state element; a mount substrate on which the solid-state element is mounted, the mount substrate having a thermal expansion coefficient substantially equal to the solid-state element; and an inorganic seal portion that seals the solid-state element, wherein the solid-state element comprises a contact electrode layer with a thermal expansion coefficient substantially equal to the solid-state element, and a joint portion that is formed on the contact electrode layer and is connected to a wiring portion formed on the mount substrate.
 12. A solid-state element device, comprising: a solid-state element comprising: a semiconductor layer formed on a substrate, the semiconductor layer comprising a first layer that corresponds to an emission area of the solid-state element to and a second layer through which current is supplied to the first layer; and a light discharge surface through which light emitted from the first layer is externally discharged, the light discharge surface being located on the side of the substrate; a contact electrode layer with a thermal expansion coefficient substantially equal to the solid-state element; a joint portion that is formed on the contact electrode layer and is connected to an external wiring portion. a mount substrate on which the solid-state element is mounted, the mount substrate having a thermal expansion coefficient substantially equal to the solid-state element; and an inorganic seal portion that seals the solid-state element.
 13. The solid-state element device according to claim 11, wherein: the joint portion is formed partially on the contact electrode layer.
 14. The solid-state element device according to claim 12, wherein: the joint portion is formed partially on the contact electrode layer.
 15. The solid-state element device according to claim 11, wherein: the inorganic seal portion comprises a glass material with a thermal expansion coefficient substantially equal to the substrate.
 16. The solid-state element device according to claim 12, wherein: the inorganic seal portion comprises a glass material with a thermal expansion coefficient substantially equal to the substrate.
 17. The solid-state element device according to claim 11, wherein: the contact electrode layer comprises a conductive metal oxide.
 18. The solid-state element device according to claim 12, wherein: the contact electrode layer comprises a conductive metal oxide.
 19. A solid-state element device, comprising: a solid-state element; a mount substrate on which the solid-state element is mounted, the mount substrate being of an inorganic material with a thermal expansion coefficient substantially equal to the solid-state element; and an inorganic seal portion that seals the solid-state element, wherein the solid-state element comprises a contact electrode layer that comprises a conductive metal oxide, and a joint portion that is formed on the contact electrode layer and is connected to a wiring portion formed on the mount substrate.
 20. The solid-state element device according to claim 17, wherein: the conductive metal oxide comprises ITO.
 21. The solid-state element device according to claim 18, wherein: the conductive metal oxide comprises ITO.
 22. The solid-state element device according to claim 19, wherein: the conductive metal oxide comprises ITO. 